Self-assembly of block copolymers grafted onto a flat substrate: Recent progress in theory and simulations**Project supported by the National Natural Science Foundation of China (Grant Nos. 20990234, 20925414, and 91227121), the Program for Changjiang Scholars and Innovative Research Team in University, China (Grant No. IRT1257), the Programme of Introducing Talents of Discipline to Universities, China, and by the Tianhe No.

Abstract

Block copolymers are a class of soft matter that self-assemble to form ordered morphologies on the scale of nanometers, making them ideal materials for various applications. These applications directly depend on the shape and size of the self-assembled morphologies, and hence, a high degree of control over the self-assembly is desired. Grafting block copolymer chains onto a substrate to form copolymer brushes is a versatile method to fabricate functional surfaces. Such surfaces demonstrate a response to their environment, i.e., they change their surface topography in response to different external conditions. Furthermore, such surfaces may possess nanoscale patterns, which are important for some applications; however, such patterns may not form with spun-cast films under the same condition. In this review, we summarize the recent progress of the self-assembly of block copolymers grafted onto a flat substrate. We mainly concentrate on the self-assembled morphologies of end-grafted AB diblock copolymers, junction point-grafted AB diblock copolymers (i.e., Y-shaped brushes), and end-grafted ABA triblock copolymers. Special emphasis is placed on theoretical and simulation progress.