Abstract
The authors report the gas phase, layer-by-layer deposition of an organosilane (N-n-butyl-aza-2,2-dimethoxysilacyclopentane, 1) and either water or aqueous ammonium hydroxide onto two substrates: Si/SiO2 and nylon. This process results in smooth, water resistant, inorganic-organic barrier layers. The layer-by-layer deposition of 1 appears to be self-limiting to a few nanometers, which may make it useful where ultrathin films of controllable dimensions and uniformity are desired. The authors are unaware of another thin film system that has these properties. Films were characterized by spectroscopic ellipsometry, water contact angle goniometry, x-ray photoelectron spectroscopy, and atomic force microscopy. Interestingly, film thicknesses on nylon were much higher than on silicon, and films prepared in the presence of the ammonia “catalyst” were thinner than those prepared with water. Test circuits coated only with a fluorosilane showed higher penetration of water compared to those coated with a barrier layer of 1/H2O and the fluorosilane.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.