Abstract
We report the formation of Ni nanodots on Si(111). Island density is varied by annealing temperature and time and is studied using atomic force microscopy (AFM) and magnetic force microscopy. Activation energies of 0.09±0.02 and 0.31±0.05eV are observed for the formation of these islands. These are associated with Ni surface self-diffusion across the (111) and (110) Ni facets, respectively. For brief 500°C anneals, regular nanodots are observed with self-limiting sizes of height ∼16nm and area 180nm×260nm, while density exhibits a power-law time dependence with exponent 1.13±0.12. AFM analysis reveals a “truncated hut” shape consistent with (110) top and (111) sidewall surfaces.
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