Selective vapor-phase deposition on patterned substrates

Abstract

Abstract Vapor growth techniques such as evaporation, sputtering, molecular beam epitaxy (MBE), and chemical vapor deposition (CVD) are usually used for large-area thin film deposition. However, local, or so-called selective, deposition onto desired regions of patterned substrates can be attained. Principally, there exist several categories of selective growth systems. In area-selective growth, the deposition takes place only on one substrate material, and no deposition is obtained on the other. This selectivity is based on a difference in the interfacial reactions between the different substrate materials and the vapor. The interfacial reactions on one substrate material should be inhibited completely to avoid nucleation, whereas the deposition reactions should be stimulated on those substrate areas where the depositon will occur. In phase-selective deposition, different phases are deposited simultaneously and selectively on the different substrate materials. In analogy to the phase-selective deposition,...