Selective growth of GaAs by organometallic vapor phase epitaxy at atmospheric pressure

Abstract

Complete selective epitaxy of GaAs by organometallic vapor phase epitaxy at atmospheric pressure was achieved by using TMG, AsH3, and AsCl3 as starting gases. Selectivity was observed at growth temperatures ranging from 650 to 750 °C. The blocking of polycrystal deposition on the mask, Si3N4, or W, is attributed to the adsorption of HCl on the mask, thus preventing the nucleation of GaAs. On the openings, the growth rate may be adjusted by controlling the TMG/AsCl3 ratio. When TMG/AsCl3<1, no growth occurs, but etching is observed.