Abstract
This paper describes an electroless deposition method for fabricating microscale metal patterns on polyimide surfaces. This method uses the selective deposition of catalytic Pd seeds via the photoinduced oxidation of Sn(II) compounds. The preparation process requires three steps: a first step in which the adsorption of Sn(II) compounds occurs on the surface of the polyimide film through ion exchange reactions, a second step in which the photoinduced oxidation of the Sn(II) compounds with atmospheric oxygen occurs in ultraviolet light (UV) irradiated areas, and a third step comprising the deposition of Pd 2+ ions in nonirradiated areas, which are simultaneously reduced.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
