Selective Deposition of Hafnium Oxide Nanothin Films on OTS Patterned Si(100) Substrates by Metal–Organic Chemical Vapor Deposition

Abstract

Soft lithography is a method for the manufacture of micro/nano size patterns and structures by using organic materials without the use of high energy. In particular, microcontact printing (muCP) is a very convenient and nonphotolithographic technique that can generate patterned features of self-assembled monolayers (SAMs). In this study, we carried out the selective deposition of HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> nano-thin films on Si(100) substrates by combination of muCP using octadecyltrichlorosilane (OTS) and metal-organic chemical vapor deposition (MOCVD). Single molecular precursor of Hf(O <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sup> Bu) <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> was used for the growth of HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> nano-films, and the deposition was carried out between 150degC and 400degC at a pressure of 3times10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-2</sup> torr. The as-grown films were characterized by x-ray diffraction (XRD), optical microscopy (OM), scanning electron microscopy (SEM), energy dispersive x-ray (EDX), x-ray photoelectron spectroscopy (XPS), and capacitance-voltage (C-V) and current-voltage (I-V) measurement. It is expected that the combination of muCP of SAM and MOCVD is a better method for fabricating the HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> thin films between micro and nano sizes