Abstract
Measurements of the intensities of low-energy secondary ions emitted from clean and oxidized polycrystalline vanadium surfaces under (25--275)-keV He/sup +/, Ne/sup +/, Ar/sup +/, and Kr/sup +/ bombardment are reported. Whereas the intensities of the metallic-ion species are observed to be proportional to the sputtering yield of vanadium and, therefore, dependent on elastic energy deposition, the intensities of O/sup +/ ions are not. Rather, they increase linearly with increasing projectile velocity in a manner similar to the electronic stopping power or, equivalently, to the yield of secondary electrons. While the production of metallic ions may be described adequately by a number of the proposed models of secondary-ion emission, that of O/sup +/ cannot. The possibility that O/sup +/ is produced by a mechanism similar to electron-stimulated desorption is discussed.
Published Version
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