Secondary ion bombardment effects on the magnetic properties and microstructures of ion-beam-deposited TbFe thin films

Abstract

TbFe films were produced by ion beam deposition both with and without 300 eV secondary ion bombardment (SIB). The magnetic properties and microstructures of the films were investigated. SIB was found to increase the perpendicular anisotropy coefficient, but decrease the magnetization-coercivity product (MHc=energy product) of the films. The microstructure of the films changed dramatically; the film made in the absence of SIB is amorphous while the film made with SIB during deposition consists of nanocrystals in an amorphous matrix.