Abstract
For thin film amorphous alloys, including thin film metallic glasses, novel combinatorial deposition process and high-throughput evaluation methods have been researched. Combinatorial arc plasma deposition is able to deposit thin film having various compositions directly, without layer structure with each element in the alloy system. Thin film library consist of separated samples from the thin film having various compositions. Novel high-throughput evaluation methods are also introduced. One is high-throughput evaluation method for corrosion resistance using the thin film library. Another is measurement of crystallization temperature using emissivity change at the crystallization of the amorphous samples in the library by thermography.
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