Abstract
Application of a titanium organometallic ink for silicon solar cell anti-reflection coatings prepared by conventional thick-film printing methods is described. Several titanium organometallic compounds have been synthesized and tested afterwards. The optimum ink composition consists of di-isopropoxobis (pentane-2,4-dionato) titanium as the TiO 2 source, and terpineol, ethyl cellulose, butanol as the organic vehicle. The ink has been screen-printed onto polished silicon wafers and thermally treated at above 450°C to convert the printed layer to a glass-like oxide film. Reflection spectra and ellipsometric measurements have shown that the films are optically equivalent to those prepared by other more complex techniques. Silicon sol? cells with screen-printed metallization and anti-reflection coating have shown as much as 35? in efficiency over the uncoated devices.
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