Abstract
The intensity of the scattered ArF excimer laser line was measured during photolytic, laser assisted chemical vapour deposition of tungsten from WF 6/H 2/Ar gas mixtures of different compositions. The scattering was due to nm size tungsten clusters. The scattered light intensity increases, decreases and then increases again as the WF 6 partial pressure is increased. The declining part is explained by multiple scattering of the incident light on the tungsten clusters. The intensity of the scattered light was dependent on the noble gas/H 2 concentration ratio which determines the thermal conductivity of the WF 6/H 2/noble gas mixture. The thermal conductivity influenced the lifetime of activated states of the subfluorides and hence the cluster formation and growth rate.
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