Scanning tunneling spectroscopy of a-C:H and a-C:(H, Cu) films prepared by magnetron sputtering

Abstract

Scanning tunneling spectroscopy was used to study a-C:H and a-C:(H, Cu) films under atmospheric conditions; these films were formed on semiconductor (Si) and metallic (Cr/Si) substrates using dc magnetron sputtering of graphite or graphite/copper targets. The local density of electron states was determined from normalized differential tunneling conductance with the aim of probing the individual sp 2-phase clusters. The well-defined valence-band edge and the varying (i.e., dependent on the scanning coordinate) shape of the distribution of the density of electron states within the conduction band are characteristic of the a-C:H films; also, the largest experimental value of the band gap in these films is ∼3 eV; finally, the tendency towards the stable position of the Fermi level at a level of ∼1 eV above the valence-band top is observed in a-C:H films. The a-C:(H, Cu) films are homogeneous with respect to the local density of electron states, which is accounted for by the formation of a homogeneous surface layer in the course of growth.