Abstract
The scanning photoelectron microscope is operated at a soft x-ray beamline (BL-8A) at the Photon Factory in the National Laboratory for High Energy Physics. The microscope uses a Wolter-type x-ray mirror as an x-ray focusing device for probe beam formation. The lateral resolution of the microscope is evaluated based on total photoyield imaging of Al stripes patterned on a SiO2 film. The 0.6- and 0.7-μm-wide stripes are detected with a modulation of 0.07–0.08 when a 150 eV soft x-ray microbeam with a sagittal beam size of 1.8 μm scans the stripes one dimensionally. The experimental results agree well with the changes in the photoelectron count rate expected from the beam intensity profile and from the arrangement of the stripe pattern. The highest lateral resolution attainable under current instrumental conditions is also predicted.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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