Abstract
A scanning nanolithography is demonstrated by employing near-field optical microscopy with a pulled micropipette which is used for material transport as well as distance regulation. Delivering the photoresist through the small aperture (300 nm diameter) of the pulled pipette with the shear-force distance control, we have fabricated nanometric dots (300 nm diameter) on the gold-sputtered substrate. This scheme may be also useful in nanometric control of chemical reaction and repair of nanometric structures.
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