Scanning MeV-ion microprobe for light and heavy ions

Abstract

The University of Oregon scanning ion microprobe uses a 65 cm focal length plasma lens to form 8.65 × demagnified image of an object aperture. The plasma lens focuses a positive ion beam using the self-electric field of a trapped cylindrical column of electrons of density 3−9 × 10 9 cm −3 and length 13–18 cm. Since the focusing field is electric, the focal length depends only on ion accelerating voltage and not on ion mass or charge state. Our 5 MV Van de Graaff accelerator illuminates the object aperture with a current density of ∼ 0.5 pA/mu;m 2. The lens aperture is defined by a set of slits 3.35 m beyond the object aperture slits and 2.79 m from the lens. Four pairs of deflection plates are located between the intermediate aperture and the lens. Two pairs of plates are used for each scanning direction so the beam always passes through the lens center during rastering. The 1 kV operational amplifiers that drive these plates combine three sets of signals. Computer generated voltages raster the beam. Individual dc offset voltages align the beam with the lens axis. A small 60 Hz signal cancels the effects of background 60 Hz magnetic fields along the beam line. With 1 kV rastering voltage the rastered field at the focal plane is 3 mm square for 3 MeV ions. Focal spot size is now 10 μm with a 2 mm diameter lens aperture and 5 μm with a 0.5 mm lens aperture.