Abstract
To industrialize electrowetting on dielectric (EWOD), the performance must be maintained on the large-area substrate, where the dielectric layer plays a critical role. Here we present slot-die coating HN-008N photoresist dielectric layer and screen-printing Teflon AF1600X (AFX) hydrophobic top-layer on Gen. 2.5 size ITO glass substrate of LCD industry (400 mm × 500 mm) for EWOD. The scalable coating of 500 nm HN-008N/800 nm AFX bilayer showed high throughput, good uniformity, and improved breakdown voltage (~190 V). The electric field distribution and electrowetting profiles of the bilayer with various thicknesses were systematically studied. Furthermore, the EWOD performance including applied voltage, contact angle change, and durability of the bilayer were investigated and compared with other reports. The results confirmed the capability of industrial-scale EWOD in this paper.
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