Abstract
Cambridge NanoTech has sold more than 70 atomic layer deposition (ALD) systems in the last 3 years. These turn-key and affordable systems have enabled researchers both in personal and multi-user cleanroom environments to introduce ALD to a wide range of applications: chemical, electronic, nanotechnology, MEMS, optical, biological and many more. These fields can now take advantage of the unique conformal coating capabilities of ALD. Cambridge NanoTech is continuously enhancing the ALD experience and has recently introduced a new heated ALD precursor vapor trap. Conventional stainless steel wool and activated alumina traps were inadequate for ALD applications due to precursor backstreaming and particulation. The new honeycomb channel trap avoids backstreaming and particulation and allows operators to keep pumping line components and pumps clean.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
