Abstract
Atomic layer deposition (ALD) is a chemical vapor processing method with which highly conformal, uniform, defect and pinhole free ultrathin films can be coated even on the most challenging nanoscale architectures such as high aspect ratio trenches, through silicon vias and highly tortuous through-porous networks. ALD is already widely in use in e.g. electronics, optics and sensor industries but it is rapidly gaining foothold also inside the renewable energy and clean and sustainable technology community. Picosun is Finnish, globally operating ALD equipment manufacturer whose exclusive, pioneering expertise in the field reaches back to the invention of the ALD technology itself and whose ALD systems are used by high profile industries and top level research organizations across four continents.
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