Abstract
We report on the design and fabrication of a planar integrated free-space optical system working on the basis of binary phase diffractive optical elements (DOEs) realized in GaN on a sapphire substrate. Group III-nitride/sapphire substrates enable the parallel monolithic integration of passive microoptical elements like lenses and gratings as demonstrated here and optoelectronic devices like light emitters and photodetectors on a single wafer. We present an approach for the simultaneous optimization of the efficiency of transmissive and reflective diffractive optical elements processed in a single lithographic etching step.
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