Abstract
Platinum (Pt) thin films of various thicknesses (tPt = 2–6 nm) deposited on Si(100) surface have been investigated for nanostructures growth under low energy ion irradiation at different angles of incidence. The resultant surface studies show that angle-dependent sputtering and larger tPt favor nanostructures’ formation. Stopping and Range of Ions in Matter (SRIM) simulation, Rutherford backscattering spectrometry (RBS) and kinetic roughening analysis along with scaling components (growth and roughness) predicts that the sputtering and surface diffusion favors surface nanostructuring for thick films at higher angle irradiations. This systematic observation of angle-dependent nanostructuring is important for surface engineering of thin films-based devices.
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