Abstract
α-4T thin films of various thicknesses are prepared by thermal evaporation method. The electrical conductivity (σ) of as deposited α-4T thin films of thicknesses 50 nm, 100 nm and 200 nm have been measured using Hall measurement system (HMS). Using the measured values of conductivity and energy gap, the constant σ0 has been estimated for thin films of various thicknesses. Thus, the electrical conductivity of the thin films of 50 nm, 100 nm and 200 nm have been estimated for various temperatures (T). Ln (σ) vs. 1000/T plots for thin films of various thicknesses have been drawn. The conductivity is found to decrease with increase in thickness of the thin film, as it changes from 50 nm to 200 nm.
Highlights
Α-4T thin film undergoes re-sublimation with increase in temperature
A new theoretical technique has been adopted to study the dependence of electrical conductivity of α-4T thin films of different thicknesses
These glass substrates which are totally free from any sort of contamination have been used for the deposition of thin films. α-4T powder has been placed in pre-cleaned molybdenum boat of dimension 23 x 13 x 11 mm and the cleaned glass substrates are placed at distance of 20 cm above the boat and well enclosed by the bell jar of the coating unit
Summary
Shreekrishna Kumar1 1School of Technology and Applied Sciences, Mahatma Gandhi University, Pullarikunnu Campus, Malloosserry P.O., Kottayam, Kerala 686041, India 2Dayananda Sagar College of Engineering, Kumaraswamy Layout, Bangalore, Karnataka 560 078, India 3School of Pure and Applied Physics, Mahatma Gandhi University, Priyadarsini Hills P.O., Kottayam, Kerala 686 560, India (Received 24 October 2017; accepted 7 February 2018; published online 23 February 2018)
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