Abstract

We fabricated W-doped In2O3 (IWO) films at room temperature on a flexible PET substrate using an in-line arc plasma ion plating system for application as flexible transparent conducting electrodes (FTCEs) in flexible organic light emitting diodes (OLEDs) and quantum dots light emitting diodes (QDLEDs). Due to the high-energy flux of the sublimated ions generated from the plasma region, the IWO films showed a well-developed crystalline structure with a low sheet resistance of 36.39 Ohm/square and an optical transmittance of 94.6% even though they were prepared at room temperature. The low sheet resistance of the IWO film processed at room temperature is attributed to the high mobility (59 cm2/V-s) in the well-developed crystalline structure of the ion-plated IWO film and screening effect of W dopants. In addition, the better adhesion of the ion-plated IWO film on the PET substrate led to small critical outer and inner bending radii of 6 and 3 mm, respectively, against substrate bending. Due to the low sheet resistance, high optical transmittance, better crystallinity, better adhesion, and outstanding flexibility of the ion-plated IWO films, the flexible OLEDs and QDLEDs with the IWO electrodes showed better performances than flexible OLEDs and QDLEDs with sputtered flexible ITO anodes. This indicates that in-line arc plasma ion plating is a promising large area coating technique to realize room temperature processed high-quality FTCEs for flexible OLEDs and QDLEDs.

Highlights

  • Indium oxide (In2O3), zinc oxide (ZnO), and tin oxide (SnO2)-based transparent conducting oxide films have been commercialized as transparent conducting electrodes (TECs) in flat panel displays, photovoltaics, touch screen panels, transparent heaters, and transparent electronics due to their low resistivity, high optical transmittance, and ease of large area coating[1,2,3,4,5,6,7,8,9]

  • We compared the performance of flexible organic light emitting diodes (OLEDs) and flexible quantum dots light emitting diodes (QDLEDs) fabricated on ion-plated IWO and sputtered ITO films and suggested the potential of the arc plasma ion-plating technique to prepare high-quality flexible transparent conducting electrodes (FTCEs) as well as the merit of ion-plated IWO films for generation flexible OLEDs and QDLEDs

  • We investigated the characteristics of IWO films processed at room temperature on a flexible PET substrate using an in-line arc plasma ion plating system and compared the results to sputtered ITO films prepared at room temperature

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Summary

Introduction

Indium oxide (In2O3), zinc oxide (ZnO), and tin oxide (SnO2)-based transparent conducting oxide films have been commercialized as transparent conducting electrodes (TECs) in flat panel displays, photovoltaics, touch screen panels, transparent heaters, and transparent electronics due to their low resistivity, high optical transmittance, and ease of large area coating[1,2,3,4,5,6,7,8,9]. Each FTCE material still has critical problems to overcome to replace amorphous ITO electrodes such as the quality of TCE, scalability, possibility of mass production, and compatibility with the current device fabrication processes Another promising FTCE scheme is high-mobility oxide TCEs such as InWO, InMoO, InZrO, InTiO, InNbO, InTaO, and InGeO films prepared by typical sputtering processes[22,23,24,25,26,27,28]. In spite of various merits of IWO films, there is no report on electrical, optical, and mechanical properties of ion-plated IWO films for OLEDs and QDLEDs. In this work, we comprehensively investigated the characteristics of IWO films prepared by a five-generation in-line arc plasma ion plating system at room temperature on flexible PET substrates.

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