Abstract
GaInAs-GaInAsP-InP SCH (separate-confinement heterostructure) multiquantum-film lasers with approximately 100-nm-wide wirelike active regions were fabricated by two-step low-pressure organometallic vapor-phase epitaxy (LP-OMVPE) growth and wet chemical etching and operated at room temperature. An increase in the threshold current density in such lasers was drastically reduced by using a preheating process in hydrogen atmosphere and a thin InP cover layer growth prior to the regrowth of a GaInAsP optical confinement layer. The fabrication processes presented can be very effective for realization of room-temperature operation of long-wavelength quantum-wire and quantum-box lasers based on GaInAs-InP materials. >
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
