Abstract

ZnO thin films with a thickness of 300 nm were deposited on Si and Al2O3 substrates using an electron beam evaporation technique with the aim of testing them as low cost and low power consumption gas sensors for ozone (O3). Scanning electron microscopy and atomic force microscopy were used to characterize the film surface morphology and quantify the roughness and grain size, recognized as the primary parameters influencing the gas sensitivity due to their direct impact on the effective sensing area. The crystalline structure and elemental composition were studied through Raman spectroscopy and X-ray photoelectron spectroscopy. Gas tests were conducted at room temperature and zero-bias voltage to assess the sensitivity and response as a function of time of the films to O3 pollutant. The results indicate that the films deposited on Al2O3 exhibit promising characteristics, such as high sensitivity and a very short response time (<2 s) to the gas concentration. Additionally, it was observed that the films display pronounced degradation effects after a significant exposure to O3.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.