Room-temperature and low-pressure nanoimprint lithography

Abstract

We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achieved by using Hybrane HS2550, a semi-crystalline hyperbranched resist polymer with a glass transition temperature below and a melting point above room temperature. Nanoimprint lithography at room temperature is possible with sub-100 nm resolution, as 75 nm line-and-spacing gratings were successfully fabricated with a tri-layer process and a metal lift-off. The melt viscosity of Hybrane HS2550 decreases drastically with temperature allowing nanoimprint experiments at low pressures, while maintaining imprint temperatures that are much lower than commonly required in nanoimprint technology.