Role of patterning in islands nucleation on semiconductor surfaces

Abstract

Quantum dots (QDs) grown on semiconductors surfaces are actually the main researchers' interest for applications in the forthcoming nanotechnology era. New frontiers in nanodevice technology rely on the precise positioning of the nucleation site and on controlling the shape and size of the dots. In this article we will review some recent studies regarding the control of the nucleation process on semiconductor surfaces. A few approaches to form ordered patterns on surfaces are described: natural patterning induced by surface instabilities (as step bunching or step meandering), in situ substrate patterning by Scanning Tunneling Microscopy (STM), high resolution patterning by Focused Ion Beam (FIB). Growth of epitaxial layers of semiconductors (Ge/Si(100) and InAs/GaAs(100)) on patterned surfaces has been studied by STM or Atomic Force Microscopy (AFM) unveiling the way in which the first atoms start to aggregate and identifying their exact nucleation site. Control of the dot size to match the patterning typical wavelength has been achieved by using surfactants on misoriented substrates. STM images acquired in real time allows one to identify the mechanism of Ge cluster formation on patterned Si(100), and to follow the island transition from pre-pyramid to pyramid. Nucleation of ordered Ge dots on SiO 2 substrates has been obtained thanks to FIB tight patterning, achieving island densities of 3.5 × 10 10 / cm 2 . To cite this article: N. Motta et al., C. R. Physique 7 (2006).