Abstract
Multiferroic BiFeO3 (BFO) thin films have been fabricated via flux mediated epitaxy with varying oxygen partial pressure and flux composition (Bi2O3:CuO) conditions. Transmission electron microscopy coupled with energy dispersive x-ray spectroscopy as well as piezoresponse force microscopy confirm, that with the correct flux and seed layer conditions, even at very low partial pressures (3mTorr) no secondary phases are formed. The study reveals the crucial role of the bottom seed layer and flux chemistry in epitaxy of BFO thin films and provides alternate routes to BFO epitaxy in oxygen-deficient environments.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
