Abstract
We report here the influence of initial surface roughness on the development of ion induced Si surface morphology. Surfaces of different initial roughness have been generated chemically and bombarded by 16.7keV O2+ ions at an oblique angle. It is observed that surface roughness enhances the initial perturbation, which aids to form the ion induced regular nanostructures at an ion fluence typically one to two orders of magnitude less than that are required to produce the same structures on an initially flat surface. This observation also explores the role of initial surface perturbation on the initiation of curvature dependent sputtering.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
