RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

T Ojima,T Tainosho,H Yanagihara,S Sharmin

doi:10.1063/1.5012133

T Ojima, T Tainosho + Show 2 more

Open Access

https://doi.org/10.1063/1.5012133

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Journal: AIP Advances	Publication Date: Apr 1, 2018
Citations: 5	License type: cc-by

Affiliation: University of Tsukuba

Abstract

Real-time in situ reflection high energy electron diffraction (RHEED) observations of Fe3O4, γ-Fe2O3, and (Co,Fe)3O4 films on MgO(001) substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) experiments. This suggests that the layer-by-layer growth of spinel ferrite (001) films is general in most physical vapor deposition (PVD) processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.

Highlights

Among various physical vapor deposition (PVD) techniques, magnetron sputtering is probably the most conventional and has been widely used from laboratory fundamental research to mass industrial production
reflection high energy electron diffraction (RHEED) oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering
Because sputtering is a relatively high-energy plasma assisted process, the film quality may be much different or worse than that grown by other PVD processes such as molecular beam epitaxy (MBE) and pulsed laser deposition (PLD)

Summary

Introduction

Among various physical vapor deposition (PVD) techniques, magnetron sputtering is probably the most conventional and has been widely used from laboratory fundamental research to mass industrial production. RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

Results

Conclusion