Abstract
Composite SiO x /PTFE films were deposited by rf sputtering in argon using balanced magnetron equipped with a PTFE/SiO 2 target. The composition of deposited films, found by XPS and FTIR, ranged from fluorocarbon plasma polymers with very small SiO x content up to coatings with a greater incorporation of SiO x . The hardness of fluorocarbon polymer films with increased concentration of SiO x was 2400 N/mm 2. This is between two to three times higher than in the case of fluorocarbon plasma polymers with very low SiO x content. The static contact angle of water ranges from 112 to 95° and the refractive index from 1.49 to 1.43, when incorporation of SiO x into fluorocarbon plasma polymer matrix decreases.
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