RF performance enhancement in sub-μm scaled β-Ga2O3 tri-gate FinFETs

Abstract

In this Letter, we report on the enhanced radio frequency (RF) performance in sub-micrometer scaled β-Ga2O3 tri-gate FinFETs. With a 200-nm-thick β-Ga2O3 bulk channel and a 0.35 μm gate length, the FinFETs exhibit an improved current-gain cutoff frequency of 5.4 GHz and a maximum oscillation frequency of 11.4 GHz, which are 20% and 58% improved with respect to the planar counterpart, respectively. The improved RF performance results from the enhanced gate control capability and the suppressed short-channel effects, as evidenced by the improved pinch-off characteristics, the improved transconductance, and the suppressed output conductance. It suggests that the tri-gate multi-fin architecture is a promising strategy to break the scaling limitation of the gate-channel aspect ratio toward high-performance β-Ga2O3 RF MOSFETs.