Abstract
Analysis of the optical properties of a gradient (Ti,Cu)Ox thin film is presented in this paper. The thin film was prepared using reactive co-sputtering of Ti and Cu targets. The desired elemental concentration profiles of Cu and Ti versus the thin film thickness were obtained by changing the power delivered to the magnetron equipped with Cu, while the powering of the magnetron equipped with the Ti target was maintained at a constant level during the film deposition. Optical properties were analysed using the reverse engineering method, based on simultaneously measured optical transmittance and reflectance. Detailed microstructure analysis performed using transmission electron microscopy investigations revealed that the thin film consisted of at least four areas with different structural properties. Finding a satisfying fit of theoretical to experimental data required taking into account the heterogeneity in the material composition and microstructure in relation to the depth in the prepared gradient thin film. On the basis of the built equivalent layer stack model, the composition profile and porosity at the cross-section of the prepared gradient film were evaluated, which agreed well with the obtained elemental and microscopy studies.
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