Abstract
The temperature coefficient of electrical resistivity (TCR) of ion implanted suicide films are measured by van der Pauw method. The TCR tends to become small and even changes sign at certain temperatures as the implanted ion energy increases. The experimental data are much pertinent to the theoretical fitting with weak localization at temperature below 90K. However at 90K < T < 160K, the experiment is prevailed by electron phonon interaction in the presence of disorder. The retention of positive TCR of the ion-implanted titanium suicide at a rather high residual resistivity implies an enhancement of the localization effect due to the screening of the electron-phonon interaction by the d-state hybridization of the transition metals.
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