Abstract

ABSTRACTIn the field of dermal protection, the use of chemical protective clothing (CPC) (including coveralls) are considered as the last barrier against airborne engineered nanomaterials (ENM). In the majority of cases, Type 5 CPC, used against solid particles (ISO 13982-1), perform well against ENM. But in a recent study, a penetration level (PL) of up to 8.5% of polydisperse sodium chloride airborne nanoparticles has been measured. Moreover, in all the previous studies, tests were performed on a sample of protective clothing material without seams or zippers. Thus, the potential for permeation through a zipper or seams has not yet been determined, even though these areas would be privileged entry points for airborne ENM.This work was designed to evaluate the PL of airborne ENM through coveralls and specifically the PL through the seams on different parts of the CPC and the zipper.Eight current models of CPC (Type 5) were selected. The samples were taken from places with and without seams and with a zipper. In some cases, a cover strip can be added to the zipper to enhance its sealing. Polydisperse nanoparticles were generated by nebulization of a sodium chloride solution. A penetration cell was developed to expose the sample to airborne nanometric particles. The NaCl particle concentration in number was measured with an ultrafine particle counter and the PL was defined as the downstream concentration divided by the upstream concentration.The results obtained show that the PL increased significantly in the presence of seams and could reach up to 90% depending on the seam's design. Moreover, this study classifies the different types of seams by their resistance against airborne ENM. As for the penetration of airborne NaCl particles through the zipper, the PL was greatly attenuated by the presence of a cover strip, but only for certain models of coveralls. Finally, the values of the pressure drop were directly linked to the type of seam. All of these conclusions provide recommendations to both manufacturers and users.

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