Abstract
The diamond films deposition experiment is carried out with MPCVD system. Some technology problems are discussed respectively, such as the substrate pretreatment, gases source compositions and deposition temperature. XRD pictures with different peaks illustrated that diamond film has good crystal orientation. A density of film crystal is observed and a thickness uniformity in detected by Scanning Electron Microscopy (SEM). The pureness of the diamond film was measured by Raman spectroscopy. The parameter coincidence rate is 90% based on the 10 prepared samples
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