Abstract
To solve the problem that generation of mask image based on STL model for integral Stereolithography System, a novel method that can generate mask image based on STL model for integral Stereolithography System is proposed. Firstly, contour data is obtained with STL model slicing software; then properties of contour loop’s internal and external are determined; and then the order of contour loop’s filling is determined; Lastly, the contour loop is filled with the order, and mask image based on STL model can be produced. Generation of mask image is implemented with VC++6.0. The verification result indicates that this method can fill multiple nested contour loops correctly and generate correct mask image for integral Stereolithography System.
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