Abstract
Removal of resin residues from quartz surfaces is one of the most critical issues in ultraviolet (UV) nanoimprint lithography (NIL) processes. Traces of resin residues on a quartz stamp cause pattern defects in the subsequent UV NIL process. This study investigates the effect of UV/O3 pretreatment and ozone dissolved water (DIO3) cleaning with megasonic (MS) on UV-cured resin removal. The bulk resin was oxidized and removed partly by UV/O3 pretreatment. The resin residues which remained on the surface in the form of a thin layer were removed by cleaning with 40ppm DIO3 along with megasonic. Subsequently, cleaning was performed using a 10% KOH solution to remove the adhesion promoter. Contact angle measurements showed that the surface was hydrophilic in nature, which confirms the complete removal of the UV-cured resin and adhesion promoter from the SiO2 substrate.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
