Abstract
The removal and transfer of ceramic target materials in laser-assited physical vapour deposition are investigated as a function of laser parameters and processing variables. Removal was measured by a microbalance and characteristics of angular distribution, transfer by emission spectroscopy and high-speed photography. The composition, the ionization state of the particles and the electron temperature of the vapour/plasma govern the structures of the thin films deposited, which are discussed in view of applications.
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