Abstract
The slot antenna microwave plasma source is used for remote plasma deposition of scratch resistant films on polycarbonate substrates. A grid separates the primary discharge from the process chamber. The monomer hexamethyldisiloxan is distributed 5–50 mm over the substrate positioned 5–25 cm from the separation grid. With argon in the primary discharge a good sticking interface polymer layer grows. An additional amount of oxygen leads to a quartzlike layer on top. Deposition rate is typically 0.5 µm/min. Rubber and tumble abrasion tests are used to characterise the scratch resistance.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
