Abstract
The possibility of using of the relative length δ0 as a parameter, determining the polymorphous crystallization mode of amorphous films, was considered. Following polymorphous crystallization modes have been identified based on the structural and morphological characteristics. Layer polymorphous crystallization mode, describes the nucleation and growth of a single-crystal layer in the field of the electron-beam impact, for which δ0 is about several thousand (3000…5000). Island polymorphous crystallization mode, describes the nucleation and growth of a polycrystalline layer, for which δ0 is about several hundred (100…1100). Dendrite polymorphous crystallization mode, describes the nucleation and growth of dendrite, for which δ0 is about several thousand (~ 4000).
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