Abstract
Fe films have been deposited by ion beam sputtering. The sputtering voltage, VS was varied in the range of 300-1800 V. The VS dependence of the properties of the Fe films and the energy / the number of the energetic particles, such as the sputtered atoms and the recoiled Arions have been investigated in detail. The saturation magnetization 4πMS was an almost constant value of 21 kG, except the condition at VS of 300 V. The coercivity HC took the minimum value of 5 Oe at VS of 1200 V. It was estimated from Monte-Carlo simulation that the ratio of the recoiled Arions to the sputtered Fe atoms to the substrate was 7-24 % and the average energy of the recoiled Ar ions was 50-370 eV. The bombardment by the recoiled Ar ions with the optimum energy improved the saturation magnetization as high as that of pure Fe and reduced significantly the coercivity of the Fe films.
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