Abstract
Fe films have been deposited by ion beam sputtering using Ar, Kr, and Xe gases. The sputtering voltage VS was varied in the range of 900–1800 V. The magnetic properties of the films had the significant relationship with the element of the sputtering gas. The saturation magnetization 4πMS was 21 kG for Ar and 20 kG for Kr or Xe. The coercivity HC took the minimum value of 5 Oe at VS of 1200 V for Ar. The energy/the number of the energetic particles, such as the sputtered atoms and the recoiled ions bombarding to the substrate was calculated by Monte-Carlo simulation in the sputtering system with an amorphous Fe target. The average energy of the sputtered atoms ES was 40–60 eV for Ar, 30–34 eV for Kr and 24–34 eV for Xe. The average energy of the recoiled ions ER was 200–370 eV for Ar, 60–100 eV for Kr, and 25–50 eV for Xe. The energy was remarkably different among their sputtering gases with different atomic mass. The bombardment by the recoiled ions at the high energy reduced the coercivity HC of the Fe films.
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