Relation between the CF2 radical and plasma density measured using LIF and cutoff probe in a CF4 inductively coupled plasma

Abstract

The behavior of the CF2 radical was studied in a CF4 inductively coupled plasma. The CF2 radical was measured using a laser-induced fluorescence method. Absolute electron density was measured using a cutoff probe and the electron temperature was measured using a double probe to study the relationship between these electron properties and the CF2 radical. To examine the relationship between them, the CF2 radical and electron density were measured as a function of the rf power, which is a major external parameter influencing the electron density. As the rf power was increased, the CF2 radical density increased in the range of low electron density, and then decreased beyond a critical electron density. The dependence of the CF2 radical density on the electron density was theoretically analyzed with rate equations. The theoretical result was in good agreement with experiment.