Registration of Alpha Particles of a Wide Energy Range in Polycarbonate

Abstract

To broaden the registration energy range from 1.5 MeV up to about 5 MeV under one single electrochemical etching (ECE) processing of Lexan polycarbonate at about 27°C with the aim of reducing the background, and the ECE time, etc., methanol (CH 3 OH) was added as a mixture with PEW (a mixture of potassium hydroxide, ethanol, and water), under optimised conditions. Registration of alpha particle energies from 0.3 MeV up to about 2.8 MeV in a short etching duration was possible by using of PEWEG solution (a mixture of potassium hydroxide, ethanol, water, and ethylene glycol) as etchant, under optimised conditions.