Refractive index inhomogeneity of LaF3 film at deep ultraviolet wavelength

Abstract

It is well known that the optical property of an optical thin film can be influenced by even small inhomogeneity of refractive index (RI). In order to investigate the RI inhomogeneity of LaF3 single layer in deep ultraviolet (DUV) range, single-layer LaF3 samples deposited on fused silica and CaF2 substrates are prepared by resistive heating evaporation at different deposition temperatures. The reflectance and transmittance spectra of LaF3 film samples are measured with a spectrophotometer, and used to calculate the RI inhomogeneity. The experimental results show that no RI inhomogeneity of LaF3 film is observed when deposited on CaF2 substrate, while negative RI inhomogeneity is presented when deposited on fused silica substrate. The level of inhomogeneity is affected by the substrate temperature, which decreases with the increasing substrate temperature from 250 to 400 oC.