Correlation between properties of HfO2 films and preparing parameters by ion beam sputtering deposition

Abstract

Ion beam sputtering is one of the most important technologies for preparing hafnium dioxide thin films. In this paper, the correlation between properties of hafnium dioxide thin films and preparing parameters was systematically researched by using the orthogonal experiment design method. The properties of hafnium oxide films (refractive index, extinction coefficient, deposition rate, stress, and inhomogeneity of refractive index) were studied. The refractive index, extinction coefficient, physical thickness, and inhomogeneity of refractive index were obtained by the multiple wavelength curve-fitting method from the reflectance and transmittance of single layers. The stress of thin film was measured by elastic deformation of the thin film-substrate system. An orthogonal experimental strategy was designed using substrate temperature, ion beam voltage, ion beam current, and oxygen flow rate as the variables. The experimental results indicated that the temperature of the substrate is the key influencing parameter on the properties of hafnium oxide films, while other preparing parameters are also correlated with specific properties. The experimental results are significant for selecting proper parameters for preparing hafnium oxide films with different applications.