Abstract
Transmission spectra of TiO2 films grown by atomic layer deposition on fused silica have been analysed by using Lorentz dispersion and a model consisting of two sublayers inside a film. It has been shown that the deposition process parameters significantly influenced the refractive index gradient in the film growth direction. The films grown at a lower flow of the carrier gas showed a 35 nm thick sublayer with low refractive index at the silica substrate and a layer with a higher refractive index at the film surface. The films deposited at higher carrier gas flow had a higher refractive index at the substrate and a lower refractive index at the film surface. The results also demonstrate that by using a parameter modelling one can obtain some information about the internal structure of a film even if there are no clearly defined interference fringes in a transmission spectrum.
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