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Abstract
Application of x-ray multilayers as reflective x-ray masks for x-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect x-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an x-ray tube (λ = 0.154 nm) and a synchrotron (λ ∼ 0.35 nm). The compression of the mask segments by 14–33 times with the imprint size in the resist plane 3.5–4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.
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