Abstract
The surface oxidation of Au thin films in UV/ozone and the reduction of AuOx surfaces at room temperature was investigated by X-ray photoelectron spectroscopy, work function measurements, and optical reflectance spectroscopy. The optical reflectance from the surface of an 11-nm-thick Au film formed on a Si substrate with a 120-nm-thick SiO2 layer exhibited a value close to zero at a specific wavelength around 535 nm as a result of interference in the multilayer structure of the substrate. The formation of AuOx on top of the Au slightly shifts the wavelength of the minimum reflectance. A pattern of oxidized AuOx regions and non-oxidized Au regions was formed on the surface of a sample by using a shadow mask during the UV/ozone exposure; illuminating this sample with quasi-monochromatic light in an optical microscope equipped with a digital camera enabled direct observation of the change in the reflectance caused by the formation of AuOx. The contrast of the AuOx region gradually decreased with time. The relationship between the contrast decrease and the reduction of AuOx was investigated.
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